Research summary
Research summary
Topic summary
How chips are made, from wafer to package, and which steps actually matter.
Key research questions
- ASML's EUV Shipments and Projections
- EUV Lithography Applications
Important claims and supporting citations
In the late 1990s, the U.S. government barred Japanese competitors Nikon and Canon from licensing EUV LLC research, restricting access to ASML and Silicon Valley Group (SVG).
The Netherlands government, under the Wassenaar Arrangement and expanded September 2024 regulations, has blocked ASML from exporting commercial EUV lithography machines to mainland China.
ASML's optical trains use Zeiss-manufactured Bragg reflectors made of 40-50 alternating layers of molybdenum and silicon to reflect 13.5 nm EUV light.
Canon introduced the FPA-1200NZ2C nanoimprint lithography (NIL) stepper in October 2023 as an alternative to EUV for sub-5nm pattern replication.
Canon's nanoimprint lithography consumes approximately 90% less electricity than ASML's EUV scanners.
Trumpf (Germany) is the sole supplier of the high-power CO2 industrial drive lasers used in ASML's EUV systems.
Each Trumpf EUV drive laser system contains over 457,000 parts, weighs 17 metric tons, and uses 7.3 km of cabling.
Due to mirror reflectivity limits, approximately 98% of EUV photons are absorbed before reaching the photoresist in an 11-mirror optical train.
View all claims (text)
Claims
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Advanced chip manufacturing, specifically for 2nm-class and smaller nodes, relies on a supply chain character…
Advanced chip manufacturing, specifically for 2nm-class and smaller nodes, relies on a supply chain characterized by extreme chokepoints.
Labels: Inferred, Medium
ASML, located in Veldhoven, Netherlands, is the sole global supplier of EUV lithography, with no existing sub…
ASML, located in Veldhoven, Netherlands, is the sole global supplier of EUV lithography, with no existing substitute.
Labels: Inferred, Medium
DUV (deep ultraviolet) lithography remains crucial for manufacturing the majority of layers in semiconductor…
DUV (deep ultraviolet) lithography remains crucial for manufacturing the majority of layers in semiconductor devices.
Labels: Inferred, Low
ASML's EUV Shipments and Projections
ASML's EUV Shipments and Projections
Labels: Inferred, Low
EUV Lithography Applications
EUV Lithography Applications
Labels: Inferred, Low
ASML's optical trains use Zeiss-manufactured Bragg reflectors made of 40-50 alternating layers of molybdenum…
ASML's optical trains use Zeiss-manufactured Bragg reflectors made of 40-50 alternating layers of molybdenum and silicon to reflect 13.5 nm EUV light.
Labels: Source-linked, Low
Canon introduced the FPA-1200NZ2C nanoimprint lithography (NIL) stepper in October 2023 as an alternative to…
Canon introduced the FPA-1200NZ2C nanoimprint lithography (NIL) stepper in October 2023 as an alternative to EUV for sub-5nm pattern replication.
Labels: Source-linked, Low
Nikon's abandoned EUV1 architecture used xenon discharge-produced plasma (DPP), while ASML succeeded by utili…
Nikon's abandoned EUV1 architecture used xenon discharge-produced plasma (DPP), while ASML succeeded by utilizing tin-droplet laser-produced plasma (LPP).
Labels: Inferred, Low
ASML's EUV technology originated from the Extreme Ultraviolet Limited Liability Company (EUV LLC), a 1997 coo…
ASML's EUV technology originated from the Extreme Ultraviolet Limited Liability Company (EUV LLC), a 1997 cooperative research agreement involving Intel, AMD, Motorola, and three U.S. Department of Energy national laboratories.
Labels: Inferred, Low
In the late 1990s, the U.S.
In the late 1990s, the U.S. government barred Japanese competitors Nikon and Canon from licensing EUV LLC research, restricting access to ASML and Silicon Valley Group (SVG).
Labels: Source-linked, High
Nanoimprint lithography is currently limited by particle contamination and template degradation, restricting…
Nanoimprint lithography is currently limited by particle contamination and template degradation, restricting its use primarily to memory (e.g., 3D NAND) rather than leading-edge logic.
Labels: Inferred, Low
Edwards Vacuum (UK) is the dominant single-source supplier for the vacuum pumping stations used in ASML scann…
Edwards Vacuum (UK) is the dominant single-source supplier for the vacuum pumping stations used in ASML scanners.
Labels: Inferred, Low
ASML holds an approximate 24.9% stake in Carl Zeiss SMT.
ASML holds an approximate 24.9% stake in Carl Zeiss SMT.
Labels: Inferred, Low
Russia's proposed EUV tool design utilizes a xenon plasma source and ruthenium-beryllium (Ru/Be) reflective m…
Russia's proposed EUV tool design utilizes a xenon plasma source and ruthenium-beryllium (Ru/Be) reflective multilayer optics to replace ASML's tin plasma and Mo/Si mirrors.
Labels: Inferred, Medium
Canon's nanoimprint lithography consumes approximately 90% less electricity than ASML's EUV scanners.
Canon's nanoimprint lithography consumes approximately 90% less electricity than ASML's EUV scanners.
Labels: Source-linked, Low
ASML provides both immersion and dry DUV solutions across i-line (365nm), KrF (248nm), and ArF (193nm wavelen…
ASML provides both immersion and dry DUV solutions across i-line (365nm), KrF (248nm), and ArF (193nm wavelengths).
Labels: Inferred, Low
Manufacturing an advanced chip requires approximately 300 or more distinct tool types, over 500 process steps…
Manufacturing an advanced chip requires approximately 300 or more distinct tool types, over 500 process steps, and materials from dozens of specialized suppliers.
Labels: Inferred, Medium
Trumpf (Germany) is the sole supplier of the high-power CO2 industrial drive lasers used in ASML's EUV system…
Trumpf (Germany) is the sole supplier of the high-power CO2 industrial drive lasers used in ASML's EUV systems.
Labels: Source-linked, Low
Each Trumpf EUV drive laser system contains over 457,000 parts, weighs 17 metric tons, and uses 7.3 km of cab…
Each Trumpf EUV drive laser system contains over 457,000 parts, weighs 17 metric tons, and uses 7.3 km of cabling.
Labels: Source-linked, Low
Low-NA EUV is utilized for all logic chips at 7nm and below, and its use is increasing for DRAM manufacturing.
Low-NA EUV is utilized for all logic chips at 7nm and below, and its use is increasing for DRAM manufacturing.
Labels: Inferred, Low
In 2012, Intel, TSMC, and Samsung invested €1.38 billion in R&D and €3.85 billion in equity to keep ASML's EU…
In 2012, Intel, TSMC, and Samsung invested €1.38 billion in R&D and €3.85 billion in equity to keep ASML's EUV program solvent.
Labels: Inferred, Medium
In March 2023, Shanghai Micro Electronics Equipment (SMEE) filed a Chinese patent application (CN118625349A)…
In March 2023, Shanghai Micro Electronics Equipment (SMEE) filed a Chinese patent application (CN118625349A) for an EUV radiation generator and lithography tool using a laser-produced plasma source.
Labels: Inferred, Medium
Multi-beam electron-beam lithography is not a viable high-volume manufacturing substitute for EUV due to sign…
Multi-beam electron-beam lithography is not a viable high-volume manufacturing substitute for EUV due to significantly slower exposure speeds.
Labels: Inferred, Low
Tsinghua University's proof-of-principle for accelerator-based EUV light generation was conducted in Berlin a…
Tsinghua University's proof-of-principle for accelerator-based EUV light generation was conducted in Berlin at the Metrology Light Source (MLS) in collaboration with Helmholtz-Zentrum Berlin (HZB) and the Physikalisch-Technische Bundesanstalt (PTB).
Labels: Inferred, Low
Tsinghua University is developing Steady-State Microbunching (SSMB) in a particle accelerator storage ring to…
Tsinghua University is developing Steady-State Microbunching (SSMB) in a particle accelerator storage ring to generate continuous, coherent EUV light for multiple lithography stations.
Labels: Inferred, Medium
ASML's EUV source generates plasma by firing 50,000 molten tin droplets per second, which are struck by laser…
ASML's EUV source generates plasma by firing 50,000 molten tin droplets per second, which are struck by laser pulses to reach temperatures of approximately 220,000 °C.
Labels: Inferred, Low
Due to mirror reflectivity limits, approximately 98% of EUV photons are absorbed before reaching the photores…
Due to mirror reflectivity limits, approximately 98% of EUV photons are absorbed before reaching the photoresist in an 11-mirror optical train.
Labels: Source-linked, Low
High-NA EUV machines are suitable for 1.4nm-generation logic and 10nm-and-beyond DRAM.
High-NA EUV machines are suitable for 1.4nm-generation logic and 10nm-and-beyond DRAM.
Labels: Inferred, Low
ASML acquired Silicon Valley Group (SVG) in 2001 for approximately $1.6 billion, consolidating rights to the…
ASML acquired Silicon Valley Group (SVG) in 2001 for approximately $1.6 billion, consolidating rights to the U.S. government-developed EUV baseline.
Labels: Inferred, Low
ASML maintains a registry of approximately 340 EUV systems and uses cryptographic telemetry to monitor health…
ASML maintains a registry of approximately 340 EUV systems and uses cryptographic telemetry to monitor health and remotely disable systems if operated in unauthorized environments.
Labels: Inferred, High
The Institute of Physics of Microstructures of the Russian Academy of Sciences (IPM RAS) has a roadmap target…
The Institute of Physics of Microstructures of the Russian Academy of Sciences (IPM RAS) has a roadmap targeting sub-10nm EUV capability by 2037 using an 11.2 nm wavelength.
Labels: Inferred, Medium
The Netherlands government, under the Wassenaar Arrangement and expanded September 2024 regulations, has bloc…
The Netherlands government, under the Wassenaar Arrangement and expanded September 2024 regulations, has blocked ASML from exporting commercial EUV lithography machines to mainland China.
Labels: Source-linked, High
Chinese startup Prinano delivered its first commercial PL-SR series inkjet step-and-repeat nanoimprint lithog…
Chinese startup Prinano delivered its first commercial PL-SR series inkjet step-and-repeat nanoimprint lithography tool in 2025, capable of sub-10nm line production.
Labels: Inferred, Medium
Canon exited optical EUV development by 2010 to focus on nanoimprint lithography.
Canon exited optical EUV development by 2010 to focus on nanoimprint lithography.
Labels: Source-linked, Low
Nikon developed a full-field 0.25 NA EUV scanner prototype (EUV1) in 2007 but canceled commercial production…
Nikon developed a full-field 0.25 NA EUV scanner prototype (EUV1) in 2007 but canceled commercial production around 2011.
Labels: Inferred, Low
Directed Self-Assembly (DSA) is used in fabs to augment EUV and DUV scanners rather than displace them.
Directed Self-Assembly (DSA) is used in fabs to augment EUV and DUV scanners rather than displace them.
Labels: Source-linked, Low
7nm-class logic chips have been manufactured at high volume using 193nm immersion DUV tools with Self-Aligned…
7nm-class logic chips have been manufactured at high volume using 193nm immersion DUV tools with Self-Aligned Quadruple Patterning (SAQP), demonstrating that EUV is not an absolute physical prerequisite for 7nm nodes.
Labels: Inferred, Medium
Carl Zeiss SMT, based in Oberkochen, Germany, supplies the mirror optics for ASML's machines.
Carl Zeiss SMT, based in Oberkochen, Germany, supplies the mirror optics for ASML's machines.
Labels: Inferred, Low
In 2025, researchers at the Shanghai Institute of Optics and Fine Mechanics (SIOM) demonstrated a 1 µm solid-…
In 2025, researchers at the Shanghai Institute of Optics and Fine Mechanics (SIOM) demonstrated a 1 µm solid-state pulsed drive laser for EUV tin plasma with 3.42% conversion efficiency, intended to bypass ASML/Cymer patents.
Labels: Inferred, High
China's state-backed EUV development effort is decentralized, assigning light source development to the Harbi…
China's state-backed EUV development effort is decentralized, assigning light source development to the Harbin Institute of Technology, projection mirror optics to the Changchun Institute of Optics, Fine Mechanics and Physics, and system integration to SMEE.
Labels: Inferred, Medium
ASML agreed to source at least 55% of EUV tool components from U.S.
ASML agreed to source at least 55% of EUV tool components from U.S. suppliers and maintain domestic manufacturing facilities as a condition of joining EUV LLC and acquiring SVG.
Labels: Inferred, Medium
ASML projects approximately 80 EUV systems to be shipped in 2027.
ASML projects approximately 80 EUV systems to be shipped in 2027.
Labels: Inferred, Low
ASML, Canon, and Nikon are competitors in the DUV lithography market.
ASML, Canon, and Nikon are competitors in the DUV lithography market.
Labels: Inferred, Low
Carl Zeiss SMT is the sole and exclusive provider for ASML's EUV mirrors, illumination systems, optical lense…
Carl Zeiss SMT is the sole and exclusive provider for ASML's EUV mirrors, illumination systems, optical lenses, and collectors for its DUV and EUV tool portfolio.
Labels: Inferred, High
ASML suspended its share buyback program from July 20, 2016, through July 19, 2017, to fund the acquisition o…
ASML suspended its share buyback program from July 20, 2016, through July 19, 2017, to fund the acquisition of Carl Zeiss SMT and Hermes Microvision (HMI).
Labels: Inferred, Medium
ASML executed the formal investment agreement to acquire its minority interest in Carl Zeiss SMT on November…
ASML executed the formal investment agreement to acquire its minority interest in Carl Zeiss SMT on November 2, 2016.
Labels: Inferred, Low
Each High-NA EUV unit costs approximately $380 million.
Each High-NA EUV unit costs approximately $380 million.
Labels: Inferred, Low
Cash dividend payments from Carl Zeiss SMT to ASML were €128.1 million in 2020, €168.0 million in 2021, and €…
Cash dividend payments from Carl Zeiss SMT to ASML were €128.1 million in 2020, €168.0 million in 2021, and €178.7 million in 2022.
Labels: Inferred, Medium
ASML accounts for its stake in Carl Zeiss SMT using the equity method under IAS 28 and US GAAP with a one-qua…
ASML accounts for its stake in Carl Zeiss SMT using the equity method under IAS 28 and US GAAP with a one-quarter reporting lag.
Labels: Inferred, Medium
ASML closed the transaction to acquire its minority interest in Carl Zeiss SMT on June 28–29, 2017.
ASML closed the transaction to acquire its minority interest in Carl Zeiss SMT on June 28–29, 2017.
Labels: Inferred, Low
ASML and Carl Zeiss SMT operate under a joint framework designated as "two companies, one business" for opera…
ASML and Carl Zeiss SMT operate under a joint framework designated as "two companies, one business" for operational roadmapping and R&D alignment.
Labels: Inferred, Medium
ASML intends to ship more than 60 EUV units (combining Low-NA and High-NA) in 2026.
ASML intends to ship more than 60 EUV units (combining Low-NA and High-NA) in 2026.
Labels: Inferred, Low
The 24.9% stake in Carl Zeiss SMT was capped to remain below the German 25% "blocking minority" (Sperrminorit…
The 24.9% stake in Carl Zeiss SMT was capped to remain below the German 25% "blocking minority" (Sperrminorität) threshold.
Labels: Inferred, High
Carl Zeiss AG retains a 75.0% limited partnership interest in Carl Zeiss SMT Holding GmbH & Co.
Carl Zeiss AG retains a 75.0% limited partnership interest in Carl Zeiss SMT Holding GmbH & Co. KG.
Labels: Inferred, Low
ASML's 24.9% ownership in Carl Zeiss SMT is held as a limited partnership interest (Kommanditanteil) of €24,9…
ASML's 24.9% ownership in Carl Zeiss SMT is held as a limited partnership interest (Kommanditanteil) of €24,900 of the €100,000 statutory capital in Carl Zeiss SMT Holding GmbH & Co. KG.
Labels: Inferred, Medium
The transaction governance agreement granted ASML supervisory board representation at Carl Zeiss SMT GmbH and…
The transaction governance agreement granted ASML supervisory board representation at Carl Zeiss SMT GmbH and participation rights in joint Operational Committees.
Labels: Inferred, Medium
ASML classifies its stake in Carl Zeiss SMT as "Investments in associates" in its annual reports.
ASML classifies its stake in Carl Zeiss SMT as "Investments in associates" in its annual reports.
Labels: Inferred, Low
SMT Holding Management GmbH acts as the managing general partner (Komplementär) of Carl Zeiss SMT Holding Gmb…
SMT Holding Management GmbH acts as the managing general partner (Komplementär) of Carl Zeiss SMT Holding GmbH & Co. KG and holds a 0.1% capital participation.
Labels: Inferred, Low
Carl Zeiss SMT's annual dividend distribution to ASML rose to €320.5 million for fiscal year 2025.
Carl Zeiss SMT's annual dividend distribution to ASML rose to €320.5 million for fiscal year 2025.
Labels: Inferred, Medium
High-NA EUV (0.55 NA, EXE series) can resolve 8nm features.
High-NA EUV (0.55 NA, EXE series) can resolve 8nm features.
Labels: Inferred, Low
Low-NA EUV (0.33 NA, NXE series) can resolve 13nm features per exposure.
Low-NA EUV (0.33 NA, NXE series) can resolve 13nm features per exposure.
Labels: Inferred, Low
Ten High-NA EUV systems are currently operational at four customer sites globally.
Ten High-NA EUV systems are currently operational at four customer sites globally.
Labels: Inferred, Low
The German Federal Cartel Office (Bundeskartellamt) cleared ASML's minority acquisition of Carl Zeiss SMT in…
The German Federal Cartel Office (Bundeskartellamt) cleared ASML's minority acquisition of Carl Zeiss SMT in January 2017.
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Carl Zeiss SMT Holding GmbH & Co.
Carl Zeiss SMT Holding GmbH & Co. KG is the 100% sole owner of the operating subsidiary Carl Zeiss SMT GmbH.
Labels: Inferred, Low
ASML and Carl Zeiss AG were contractually obligated to submit antitrust filings to the Korea Fair Trade Commi…
ASML and Carl Zeiss AG were contractually obligated to submit antitrust filings to the Korea Fair Trade Commission regarding the acquisition.
Labels: Inferred, Medium
ASML committed €760 million in additional support to Carl Zeiss SMT over six years, with €220 million for EUV…
ASML committed €760 million in additional support to Carl Zeiss SMT over six years, with €220 million for EUV R&D and €540 million for capital expenditure and supply-chain facilities.
Labels: Inferred, Medium
ASML's EXE systems have collectively exposed over 1.35 million wafers.
ASML's EXE systems have collectively exposed over 1.35 million wafers.
Labels: Inferred, Low
Carl Zeiss AG is wholly owned by the Carl Zeiss Foundation (Carl-Zeiss-Stiftung), which restricts the divestm…
Carl Zeiss AG is wholly owned by the Carl Zeiss Foundation (Carl-Zeiss-Stiftung), which restricts the divestment of industrial governance.
Labels: Inferred, Medium
ASML's order data for 2027 planned deliveries includes 56 Low-NA EUV scanners.
ASML's order data for 2027 planned deliveries includes 56 Low-NA EUV scanners.
Labels: Inferred, Low
ASML's order data for 2027 planned deliveries includes 10 High-NA scanners.
ASML's order data for 2027 planned deliveries includes 10 High-NA scanners.
Labels: Inferred, Low
An additional three High-NA EUV systems are in the process of being shipped and installed.
An additional three High-NA EUV systems are in the process of being shipped and installed.
Labels: Inferred, Low
The 56 Low-NA EUV scanners planned for 2027 deliveries include five units for Intel, seven for Samsung, and u…
The 56 Low-NA EUV scanners planned for 2027 deliveries include five units for Intel, seven for Samsung, and up to 20 for SK Hynix.
Labels: Inferred, Low